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OPTIspin SST20 - Spin Coating and Cleaning
Spin coating and cleaning system for semiconductor processes
OPTIspinSemi automatic equipment
Prozesse
CoatingCleaningSpinningDeveloping
Maximaler Produktdurchmesser
Ø 200 mmOPTIspin SST20
Spinner module for coating and cleaning within process:
OPTIspin SST 20
- Stand - Alone Spinner System for Coating, Cleaning or Developing applications for wafer up to Ø 8" (Ø 200 mm) and substrates up to 6" x 6" (150 mm x 150 mm)
System configuration
- Stand - Alone cabinet with all process modules integrated
- Multi piece process bowl (easily dismountable for cleaning purposes) with splash ring
- 19" controller unit with USB interface
- Spinner system with process bowl cover (hardware interlock secured)
- Multi piece process bowl (easily dismountable for cleaning purposes) with splash ring Industrial full-colour touchscreen HMI
- Industrial full-colour touchscreen HMI
- PC-based recipe management and backup software - For more comfortable recipe writing and storage
- Digital documentation and operating manuals available for download as download
- Requires at least one chuck (Not included !)
Technical data
- Voltage: UAC= 230 V / N / PE / 50 Hz (60 Hz) / 16A
- Motor-Speed: 1 up to 10,000rpm* in 1rpm steps
- Motor-Acceleration ramp: 1 up to 50,000 rpm/sec* in steps 1rpm/sec (depending on substrate size and load)
- Spinning time: 1 up to 999 s - Adjustable in 0.1 s steps
- Substrate size: Up to Ø 8" (Ø 200 mm) or 6" x 6" (150 mm x 150 mm)
- Process bowl Standard of Polypropylene (PP)
- Process exhaust: Outer diameter OD 110 mm, 200m3/h
- Drain: 5 liter waste tank and high-level sensor, inside the cabinet
- Compressed air: Clean Dry Air (CDA) 8 ± 2 bar
- Vacuum: -0.8 ± 0.2 bar
- Nitrogen (N2): 4.0 ± 0.5 bar
- CE marked system
Chucks: Option
Dispense: Option
Nozzle: Option