Produktgalerie
Prozessanlagen für Single Wafer Processing
Entdecken Sie aktive und abgekündigte Robotechnik-Systeme für Single Wafer Processing.
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43 Produkte angezeigt
48 Produkte im Katalog
OPTIwet ST75 - Spin Wet
Stand-alone spin wet process system for semiconductor substrates
Max. Produktdurchmesser: Ø 750 mm
OPTIwet ST60 - Spin Wet
Stand-alone spin wet process system for semiconductor substrates
Max. Produktdurchmesser: Ø 600 mm
OPTIwet ST30 - Spin Wet
Stand-alone spin wet process system for semiconductor substrates
Max. Produktdurchmesser: Ø 300 mm
OPTIspray ST30i - Spray Coating
Stand-alone spray coating system for semiconductor processes
Max. Produktdurchmesser: Ø 300 mm
OPTIspray ST22i - Spray Coating
Stand-alone spray coating system for semiconductor processes
Max. Produktdurchmesser: Ø 200 mm
OPTIspray ST20i - Spray Coating
Stand-alone spray coating system for semiconductor processes
Max. Produktdurchmesser: Ø 200 mm
OPTIspin ST32+ - Spin Coating
Spin coating and cleaning system for semiconductor processes
Max. Produktdurchmesser: Ø 300 mm
OPTIspin ST32 - Spin Coating
Spin coating and cleaning system for semiconductor processes
Max. Produktdurchmesser: Ø 300 mm
OPTIspin ST30 - Spin Coating
Spin coating and cleaning system for semiconductor processes
Max. Produktdurchmesser: Ø 300 mm
OPTIspin ST23+ - Spin Coating and Cleaning
Spin coating and cleaning system for semiconductor processes
Max. Produktdurchmesser: Ø 200 mm
OPTIspin ST23 - Spin Coating and Cleaning
Spin coating and cleaning system for semiconductor processes
Max. Produktdurchmesser: Ø 200 mm
OPTIspin ST22+ - Spin Coating and Cleaning
Spin coating and cleaning system for semiconductor processes
Max. Produktdurchmesser: Ø 200 mm
OPTIspin ST22 - Spin Coating and Cleaning
Spin coating and cleaning system for semiconductor processes
Max. Produktdurchmesser: Ø 200 mm
OPTIspin ST20 - Spin Coating and Cleaning
Spin coating and cleaning system for semiconductor processes
Max. Produktdurchmesser: Ø 200 mm
OPTIspin SST20 - Spin Coating and Cleaning
Spin coating and cleaning system for semiconductor processes
Max. Produktdurchmesser: Ø 200 mm
OPTIspin SB30 - Spin Coating
Spin coating and cleaning system for semiconductor processes
Max. Produktdurchmesser: Ø 300 mm
OPTIspin SB20 - Spin Coating and Cleaning
Spin coating and cleaning system for semiconductor processes
Max. Produktdurchmesser: Ø 200 mm
OPTIhot VB20 - Hotplate HMDS
HMDS hotplate system for wafer priming and dehydration bake processes
Max. Produktdurchmesser: Ø 200 mm
OPTIhot SVT20 - Hotplate HMDS
HMDS hotplate system for wafer priming and dehydration bake processes
Max. Produktdurchmesser: Ø 200 mm
OPTIhot SHT30+ - Hotplate
Hotplate system for lithography baking processes
Max. Produktdurchmesser: Ø 300 mm
OPTIhot SHT20+ - Hotplate
Hotplate system for lithography baking processes
Max. Produktdurchmesser: Ø 200 mm
OPTIhot SHT20 - Hotplate
Hotplate system for lithography baking processes
Max. Produktdurchmesser: Ø 200 mm
OPTIhot HB30+ - Hotplate
Hotplate system for lithography baking processes
Max. Produktdurchmesser: Ø 300 mm
OPTIhot HB20+ - Hotplate
Hotplate system for lithography baking processes
Max. Produktdurchmesser: Ø 200 mm
OPTIhot HB20 - Hotplate
Hotplate system for lithography baking processes
Max. Produktdurchmesser: Ø 200 mm
OPTIcoat ST75 - Spin Coating
Spin coating system with Covered Chuck technology
Max. Produktdurchmesser: Ø 750 mm
OPTIcoat ST60 - Spin Coating
Spin coating system with Covered Chuck technology
Max. Produktdurchmesser: Ø 600 mm
OPTIcoat ST32+ - Spin Coating
Spin coating system with Covered Chuck technology
Max. Produktdurchmesser: Ø 300 mm
OPTIcoat ST32 - Spin Coating
Spin coating system with Covered Chuck technology
Max. Produktdurchmesser: Ø 300 mm
OPTIcoat ST30 - Spin Coating
Spin coating system with Covered Chuck technology
Max. Produktdurchmesser: Ø 300 mm
OPTIcoat ST23+ - Spin Coating
Spin coating system with Covered Chuck technology
Max. Produktdurchmesser: Ø 200 mm
OPTIcoat ST23 - Spin Coating
Spin coating system with Covered Chuck technology
Max. Produktdurchmesser: Ø 200 mm
OPTIcoat ST22+ - Spin Coating
Spin coating system with Covered Chuck technology
Max. Produktdurchmesser: Ø 200 mm
OPTIcoat ST22 - Spin Coating
Spin coating system with Covered Chuck technology
Max. Produktdurchmesser: Ø 200 mm
OPTIcoat ST20 - Spin Coating
Spin coating system with Covered Chuck technology
Max. Produktdurchmesser: Ø 200 mm
OPTIcoat SST20 - Spin Coating
Spin coating system with Covered Chuck technology
Max. Produktdurchmesser: Ø 200 mm
OPTIcoat SB30 - Spin Coating
Spin coating system with Covered Chuck technology
Max. Produktdurchmesser: Ø 300 mm
OPTIcoat SB20 - Spin Coating
Spin coating system with Covered Chuck technology
Max. Produktdurchmesser: Ø 200 mm
Maximus 806 - Automatic Cluster
Fully automated cluster system for lithography processes
Max. Produktdurchmesser: Ø 200 mm
Maximus 804 Lift-Off - Automatic Cluster
Fully automated cluster system for lithography processes
Max. Produktdurchmesser: Ø 200 mm
Maximus 804 - Automatic Cluster
Fully automated cluster system for lithography processes
Max. Produktdurchmesser: Ø 200 mm
MAXIMUS 6003 - Automatic Cluster
Fully automated cluster system for lithography processes
Max. Produktdurchmesser: Ø 600 mm
Maximus 1203 - Automatic Cluster
Fully automated cluster system for lithography processes
Max. Produktdurchmesser: Ø 300 mm