OPTIspin ST32 - Spin Coating

OPTIspin ST32

Stand Alone Spinner system for coating, cleaning and developing within process:

• Stand - Alone Spin Coating System for wafers up to Ø 12" (Ø 300 mm) and substrates up to 9" x 9" (225 mm x 225 mm), for traditional open bowl spinning

System configuration

• Stand Alone cabinet with all process modules integrated
• Spinner system with process bowl cover (hardware interlock secured)
• Multi piece process bowl (easily dismountable for cleaning purposes) with splash ring
• Industrial full-colour touchscreen HMI for spin coater
• Temperature controller and timer for hotplate
• USB interface
• Hotplate OPTIhot HB 30 with lifting pins for 4" up to 12"
• PC-based recipe management and backup software
• Digital documentation and operating manuals available for download
• Requires at least one chuck (Not included !)

Technical data

• Voltage: UAC= 230 V / N / PE / 50 Hz (60 Hz) / 16A
• Motor speed: 1 - 6,000 rpm - Adjustable in 1 rpm steps (depending on substrate size and load)
• Motor acceleration ramp: 1 up to 2,500 rpm/s - Adjustable in 1 rpm/s steps (depending on substrate size and load)
• Spinning time: 1 up to 999 s - Adjustable in 0.1 s steps
• Substrate size: Up to Ø 12" (Ø 300 mm) or 9" x 9" (225 mm x 225 mm)
• Process bowl: Standard made of Polypropylene (PP)
• Process exhaust: Outer diameter OD 110 mm, 200m3/h
• Cabinet exhaust #1: Outer diameter OD 110 mm, 200m3/h
• Cabinet / HP exhaust #2: Outer diameter OD 110 mm, 200m3/h
• Drain: 5 liter waste tank and high-level sensor, inside the cabinet
• Compressed air: Clean Dry Air (CDA) 8 ± 2 bar
• Vacuum: -0.8 ± 0.2 bar
• Nitrogen (N2): 4.0 ± 0.5 bar
• CE marked system

Hotplate:

• Temperature range: Up to 300°C - Adjustable in 1°C steps
• Hotplate time: 1 up to 999 s - Adjustable in 0.1 s steps
• For wafer: Up to Ø 12" (Ø 300 mm)
• For substrate: Up to 9" x 9" (225 mm x 225 mm)
• Lifting pins: From Ø 4" up to Ø 12"

Chuck: Option
Dispense: Option
Nozzle: Option
Hotplate: Option