OPTIhot HB20+
bench mounted Hotplate System for typical lithography baking applications:
- Bench Mounted Hotplate System for wafer up to Ø 8"
(Ø 200 mm) and substrates up to 6" x 6" (150 mm x 150 mm)
System configuration
Hotplate System with coverRecipe programmable lifting pins (proximity) for 2" - 8" wafer Recipe programmable Nitrogen (N2) blow19" controller unitIndustrial full-colour touchscreen HMIPreset and calibrated Temperature ControllerPC-based recipe management and backup software - For more comfortablerecipe writing and storageDigital documentation and operating manuals available for download as download
Technical data:Voltage: UAC= 230 V / N / PE / 50 Hz (60 Hz) / 16A Temperature range: Up to 250°C - Adjustable in 0.1°C stepsHotplate time: 1 up to 999 s - Adjustable in 0.1 s stepsLifting pins (Proximity): From Ø 2" up to Ø 8" - Programmable in 0.1 mm stepsSubstrate size: Up to Ø 8" (Ø 200 mm) or 6" x 6" (150 mm x 150 mm)Process exhaust: Outer diameter OD 38mm, 30m3/hCompressed air: Clean Dry Air (CDA) 8 ± 2 barVacuum: -0.8 ± 0.2 barNitrogen (N2): 4.0 ± 0.5 barCE marked system
Informationen anfragen