Semiconductor manufacturing
Primary market for single wafer processing, lithography support, coating, cleaning, HMDS, hotplate and wet process modules.

High-precision systems for coating, cleaning, hotplate, HMDS, wet etching and fully automated single wafer processing.
Process solutions from cleaning, coating and HMDS systems to OPTIwet wet and etching processes as well as fully automated cluster platforms.

Spray coating systems for controlled coating processes on wafers and substrates.

Automated cluster systems that combine multiple process modules in one platform.

Precision spin coating systems for uniform and reproducible coating results.

Hotplates and HMDS systems for controlled thermal wafer processing.

Flexible spin coating and cleaning systems for single-wafer processing.

Spin wet process systems for cleaning, development, etching and wet processing.

Our systems are built for reproducible results, robust automation and service support that keeps production availability in focus.
Markets and applications
Primary market for single wafer processing, lithography support, coating, cleaning, HMDS, hotplate and wet process modules.
Process platforms for small-batch and production environments with demanding substrate handling requirements.
Wet processing, coating and thermal process solutions for Si, SiC, GaN, GaAs and related substrates.
Cluster and standalone systems for larger substrates, EWLB, panel-related processes and precision coating tasks.
Flexible process equipment for specialty substrates, R&D and technology development.
Selected coating, cleaning and surface treatment applications where controlled substrate processes are required.
Official service for leading brands

Contact our sales team for individual consultation on systems, process modules, upgrades and service.