MAXIMUS Series

Automatic Microcluster Systems for Lithography Processes
in the Semiconductor Industry

The fully-automated microcluster systems of the Maximus Series are designed for single-substrate production processes in the semiconductor industry. The system platform handles wafer sizes from Ø 2” up to Ø 750 mm and substrate sizes from 2” x 2” up to 500 mm x 500 mm. According to the process requirements all Maximus systems can be equipped flexibly with different process units like coater, developer, cleaner, hot, cool and primer plates. The Maximus Series provides all features needed for state of the art production tasks like thin-wafer handling, UV curing or Lift-Off.

MAXIMUS 804 Lift-Off

Ø 2” up to Ø 8” | 2” x 2” up to 6” x 6”
Typical chemicals: NMP, DMSO

The Maximus 804 Lift-Off is a dedicated system for high throughput single wafer processes. It is equipped with an immersion soaking bath, a high pressure spray Lift-Off cleaning unit and a final cleaning unit. The highest level of cleanliness is guaranteed through the automatic end-effector change.

The System consists of:

Cabinet MAXIMUS 804 made of stainless steel
Glass doors for process area
Stainless steel doors for media / maintenance area
3-axis robot, class 1
End effectors vacuum standard for Ø 4”, Ø 6” wafer
End effectors vacuum standard for Ø 8”wafer
Flat touch screen monitor
Computer as controller and user interface
Cassette loading plates for wafer up to Ø 8“ cassette as I/O
Pre-alignment for wafers up to Ø 8“
Remote control, for quick log file checking for service and maintenance purposes via modem, ISDN interface or USB stick
Software for easy programming of station recipes and flow recipes at the system or on a connected PC
CE marked system
An ENGLISH manual on standard paper and a CD-ROM

Technical Data:

Voltage: UAC= 3 x 208 V / N / PE / 60 Hz / 32A or UAC= 3 x 400 V / N / PE / 50 Hz / 32A
Spinner System:
Motor speed: 1 up to 10,000 rpm in 1rpm steps (depending on substrate size and load)
Motor acceleration ramp: 1 up to 50,000 rpm/sec in steps 1rpm/sec (depending on substrate size and load)
Spinning time: 0.1 up to 999sec in 0.1sec steps
Standard drain: 5 liter waste tank with high-level sensor inside the cabinet
Pressure: Clean Dry Air (CDA) 8 ± 2 bar
Vacuum: -0.8 ± 0.2 bar
Nitrogen N2 (optional): 4.0 ± 0.5 bar

Exhaust connection lift- off bath:1 x OD110mm, up to 200 m3/h
Exhaust connection high pressure module: 1 x OD110mm, up to 200 m3/h
Exhaust connection cleaner module: 1 x OD110mm, up to 200 m3/h
Exhaust connection cabinet: 3 x OD140mm, each up to 300 m3/h

Maximus 804 Lift-Off - Automatic Cluster